Ionized Jet Deposition is a Physical Vacuum Deposition (PVD) technique based on pulsed electron ablation. IJD equipment, developed by Noivion, employs a special pulsed electron source able to generate in vacuum ultra-short and electric discharges in the MW range (peak). The discharge is supported by a gas jet and directed into a solid target generating a superficial explosion and consequent emission of very energetic material in the form of a plasma with the same composition as the target. The plasma emitted by the target produces a dense coating on any object it finds on its path with the same composition as the target or combined with a reactive background gas (reactive mode).



The IJD method is based on the ionization of a gas stream flowing through a metallic nozzle which serves simultaneously as the auxiliary electrode for the plasma discharge ignition. A high voltage pulse with an amplitude of up to 25kV and a duration of less than 1µs is applied to the cathode and, through a system of trigger and auxiliary electrodes, a causes strong ionization of the gas jet that brings about ablation of the target surface.



IJD has unique characteristics delivering distinct advantages for a variety of applications.

  • STOICHIOMETRY CONSERVATION                                                                                                                                                

With appropriate conditions, IJD allows stoichiometry conservation just like a laser ablation system. This means that the same composition of the target is reproduced in the coating, allowing a relatively easy optimization of very complex materials like superconducting oxides (YBCO) or photoactive semiconductors (CIGS) that can be deposited in a single step.


  • LOW TEMPERATURE PROCESSES                                                                                                                                                

IJD films produced in the right conditions exhibit good crystalline quality even if deposited at room temperature thanks to the high plasma density and excitation. This allow to coat delicate substrates like plastic or semiconductor devices.


  • INDEPENDENT PARAMETERS                                                                                                                                                    

IJD offers mostly independent process variables allowing to explore a wide set of energies and conditions and fine tune even the more complex deposition processes. The main parameters are: acceleration voltage, gas pressure, sample-target distance, pulse repetition rate.


  • WIDE RANGE OF MATERIALS                                                                                                                                                

Thanks to strong interaction of electrons with materials IJD can work with virtually any solid material: conductive, non conductive, transparent, ultra-hard. Even high melting point metals or ultra hard oxides are feasible with excellent control and reproducibility.


  • COMPETITIVE COST                                                                                                                                                                    

IJD equipment provides more power and flexibility at a fraction of the cost of a laser ablation system. The possibility to coat large objects using small targets (10-30 mm diameter, disc shaped) offers a great cost optimization opportunity in the development of coatings made of rare and precious materials.


  • INDUSTRIAL                                                                                                                                                                              

Quality coatings, robustness, low cost and high deposition rate make IJD a good opportunity for industrial manufacturing. Contact us to discuss your application.


For more and last articles about IJD Technology you can take a look here (Noivion web presentation).

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